Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Theoretical Benchmarking of Vertical GaN Devices
RISE Research Institutes of Sweden, Digital Systems, Industrial Systems.ORCID iD: 0000-0002-9512-2689
RISE Research Institutes of Sweden, Digital Systems, Industrial Systems.
2022 (English)In: International Conference on Electrical, Computer, Communications and Mechatronics Engineering, ICECCME 2022, Institute of Electrical and Electronics Engineers Inc. , 2022Conference paper, Published paper (Refereed)
Abstract [en]

In this paper theoretical benchmarking of semi-vertical and vertical gallium nitride (GaN) MOSFETs with rated voltage of 1.2 kV to 3.3 kV is performed against corresponding silicon carbide (SiC) devices. Specific design features and technology requirements for realization of high voltage vertical GaN MOSFETs are discussed and implemented in simulated structures. The main findings are that a) specific on-resistance of vertical GaN devices is expected to be 75% and 40% of that for 1.2 kV and 3.3 kV SiC MOSFETs, respectively, b) semi-vertical GaN do not offer any advantage over SiC MOSFETs for medium and high voltage devices (>1.0 kV), and c) vertical GaN has largest potential advantage for high and ultra-high voltage devices (>2.0 kV).

Place, publisher, year, edition, pages
Institute of Electrical and Electronics Engineers Inc. , 2022.
Keywords [en]
benchmarking with SiC, device modeling, GaN, specific on-resistance, TCAD, vertical MOSFET, WBG devices, Benchmarking, Electronic design automation, III-V semiconductors, MOSFET devices, Silicon carbide, Wide band gap semiconductors, Benchmarking with silicon carbide, Device modelling, High voltage devices, MOSFETs, Rated voltages, Silicon carbide MOSFETs, Specific-on-resistance, Vertical MOSFETs, WBG device, Gallium nitride
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:ri:diva-64011DOI: 10.1109/ICECCME55909.2022.9987919Scopus ID: 2-s2.0-85146423232ISBN: 9781665470957 (electronic)OAI: oai:DiVA.org:ri-64011DiVA, id: diva2:1738664
Conference
2022 International Conference on Electrical, Computer, Communications and Mechatronics Engineering, ICECCME 2022, 16 November 2022 through 18 November 2022
Note

Funding details: Electronic Components and Systems for European Leadership, ECSEL, 826392; Funding text 1: This project has received funding from the ECSEL Joint Undertaking (JU) under grant agreement No 826392 (UltimateGaN).

Available from: 2023-02-22 Created: 2023-02-22 Last updated: 2025-09-23Bibliographically approved

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full textScopus

Authority records

Bakowski, Mietek

Search in DiVA

By author/editor
Bakowski, Mietek
By organisation
Industrial Systems
Electrical Engineering, Electronic Engineering, Information Engineering

Search outside of DiVA

GoogleGoogle Scholar

doi
isbn
urn-nbn

Altmetric score

doi
isbn
urn-nbn
Total: 135 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf