Influence of temperature and pH on SCC assisted by H 2 S susceptibility of 22 %Cr duplex
2018 (English)In: NACE - International Corrosion Conference SeriesVolume 2018-April, 2018Corrosion Conference and Expo 2018; Phoenix; United States;, National Assoc. of Corrosion Engineers International , 2018Conference paper, Published paper (Refereed)
Abstract [en]
Depending on environmental conditions UNS (1) S32205 duplex stainless steel may suffer from Stress Corrosion Cracking (SCC) assisted by H 2 S initiated by local corrosion processes that involve the selective dissolution of the ferritic phase or the austenitic phase. The intent of this paper is first to study the evolution of the susceptibility of SCC assisted by H 2 S according temperature and pH. In a second phase, links are highlighted between the differences of cracking resistance and localized corrosion morphologies. Results show that the temperature of highest susceptibility to SCC assisted by H 2 S depends on the pH of the environment, moving from 80 °C at low pH (2.8 - 3.5) to temperature between 50 - 20 °C at higher pH (4.5 - 6.0). The maximum of cracking susceptibility seems to correlate with selective corrosion of ferrite coupled with transgranular cracks of the austenite.
Place, publisher, year, edition, pages
National Assoc. of Corrosion Engineers International , 2018.
Keywords [en]
H 2 S, PH, Pitting, SSRT, Stress corrosion cracking, Temperature, Uns S32205, Chromium compounds, Dealloying, Ferrite, Localized corrosion, Residual stresses, Steel corrosion, Sulfide corrosion cracking, Corrosion morphology, Cracking resistance, Cracking susceptibility, Duplex stainless steel, Environmental conditions, Selective dissolution
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:ri:diva-40495Scopus ID: 2-s2.0-85053531675ISBN: 9781510864405 (print)OAI: oai:DiVA.org:ri-40495DiVA, id: diva2:1359976
Conference
NACE - International Corrosion Conference Series Volume 2018-April, 2018 15 April 2018 through 19 April 2018
2019-10-102019-10-102021-06-17Bibliographically approved