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New low-stress PECVD Poly-SiGe Layers for MEMS
RISE, Swedish ICT, Acreo.
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2003 (English)In: Journal of microelectromechanical systems, ISSN 1057-7157, E-ISSN 1941-0158, Vol. 12, no 6, p. 816-825Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2003. Vol. 12, no 6, p. 816-825
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Computer and Information Sciences
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URN: urn:nbn:se:ri:diva-31984OAI: oai:DiVA.org:ri-31984DiVA, id: diva2:1151842
Available from: 2017-10-24 Created: 2017-10-24 Last updated: 2018-01-13Bibliographically approved

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