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Analysis experimental verification of the influence of fabrication process tolerances circuit parasitic on transient current sharing of parallel-connected SiC JFETs
RISE, Swedish ICT, Acreo. KTH Royal Institute of Technology, Sweden.
KTH Royal Institute of Technology, Sweden.
Warsaw University of Technology, Poland; KTH Royal Institute of Technology, Sweden.
RISE, Swedish ICT, Acreo.
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2014 (English)In: IEEE transactions on power electronics, ISSN 0885-8993, E-ISSN 1941-0107, Vol. 29, no 5, p. 2180-91Article in journal (Refereed) Published
Abstract [en]

Operation of parallel-connected 4H-SiC vertical junction field effect transistors (VJFETs) from SemiSouth is modeled using numerical simulations and experimentally verified. The unbalanced currentwaveforms of parallel-connected VJFETs are investigated with respect to the spread in the critical parameters of the device structure and to the influence of the parasitic inductances in the measurement circuit. The device structures are reconstructed based on scanning electron microscopy (SEM) analysis, electrical characterization, and device simulations. The doping concentration and profile depth of a p-grid formed by angular implantation are studied as main contributors that influence the variation of the on-state characteristics, and the threshold voltage of the experimentaldevices. It has been shown elsewhere that similar differences in p-grid also lead to differences in gate-source breakdown voltage. The switching performance of the parallel-connected JFETs is measured using single and double gate drivers in a double-pulse test and compared with simulations. The switched current and voltage waveforms from measurements are reproduced in simulation by introducing the parasitics. From the analysis, it is found that reasonable differences in doping levels and profiles of the p-grid give rise to significant differences in device parameters. However, even with these parameter differences and circuit asymmetries, it is possible to successfully operate parallel-connected VJFETs of this type.

Place, publisher, year, edition, pages
2014. Vol. 29, no 5, p. 2180-91
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Computer and Information Sciences
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URN: urn:nbn:se:ri:diva-31938DOI: 10.1109/TPEL.2013.2281084Scopus ID: 2-s2.0-84893148878OAI: oai:DiVA.org:ri-31938DiVA, id: diva2:1151796
Available from: 2017-10-24 Created: 2017-10-24 Last updated: 2019-08-08Bibliographically approved

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