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Reliability of Microtechnology: Interconnects, Devices and Systems
Chalmers University of Technology, Sweden.
Nokia Siemens Networks, Finland.
Nokia Siemens Networks, Finland.
Portland State University, USA.
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2011 (English)Book (Other academic)
Place, publisher, year, edition, pages
Springer-Verlag New York, 2011.
Keywords [en]
Electronics and Microelectronics, Instrumentation, Optical Materials, Electronic Materials, Quality Control, Reliability, Safety and Risk, Nanotechnology, Microengineering
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:ri:diva-30139DOI: 10.1007/978-1-4419-5760-3Scopus ID: 2-s2.0-84891462975ISBN: 978-1-4419-5759-7 (print)ISBN: 978-1-4419-5760-3 (electronic)OAI: oai:DiVA.org:ri-30139DiVA, id: diva2:1128878
Available from: 2017-07-31 Created: 2017-07-31 Last updated: 2019-08-05Bibliographically approved

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