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Control of silver throwing power by pulse reverse electroplating
RISE - Research Institutes of Sweden, Safety and Transport, RISE Denmark. RISE - Research Institutes of Sweden, Safety and Transport, Electronics. Jönköping University, Jönköping, Sweden.
Jönköping University, Jönköping, Sweden.
Jönköping University, Jönköping, Sweden.
RISE - Research Institutes of Sweden, Safety and Transport, Electronics. RISE - Research Institutes of Sweden, Safety and Transport, RISE Denmark.
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2017 (English)In: Transactions of the Institute of Metal Finishing, ISSN 0020-2967, E-ISSN 1745-9192, Vol. 95, no 1, 25-30 p.Article in journal (Refereed) Published
Abstract [en]

The influence of electroplating parameters on throwing power (TP) is studied in additive-free silver cyanide solutions under direct current and pulse reverse electroplating conditions. It is found that the best TP is obtained when no agitation of the electrolyte is applied. The most important parameters for controlling the TP are the cathodic current density, the anodic to cathodic charge ratio, and the ratio between the anodic and cathodic current densities. Guidelines for process optimisation are given.

Place, publisher, year, edition, pages
2017. Vol. 95, no 1, 25-30 p.
Keyword [en]
Agitation, Pulse reverse electrodeposition, Silver, Throwing power, Electrolytes, Electroplating, Optimization, Cathodic charge, Cathodic current density, Direct current, Process optimisation, Pulse-reverse electrodeposition, Silver cyanide, Electroplating solutions
National Category
Other Engineering and Technologies not elsewhere specified
Identifiers
URN: urn:nbn:se:ri:diva-29192DOI: 10.1080/00202967.2017.1260895Scopus ID: 2-s2.0-85009956051OAI: oai:DiVA.org:ri-29192DiVA: diva2:1086549
Available from: 2017-04-03 Created: 2017-04-03 Last updated: 2017-04-03Bibliographically approved

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