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Dissolution kinetics of silicon nitride in aqueous suspension
YKI – Ytkemiska institutet.
YKI – Ytkemiska institutet.
1999 (English)In: Journal of Colloid and Interface Science, ISSN 0021-9797, E-ISSN 1095-7103, Vol. 218, 582-584 p.Article in journal (Refereed)
Abstract [en]

A general system of equations describing the dissolution of polydisperse solids having a porous particulate structure is set up and applied to study the hydrolysis and subsequent dissolution of silicon nitride powder in aqueous suspensions. The latter process has been found to follow a simple kinetic equation, c(t) = cs[1-exp(-kt)], with the dissolution rate constant k = 2.3E-06 1/s and the saturation concentration, cs = 3.2 mmol/l at room temperature and pH9. The role of diffusion is unimportant, so that the concentration of soluble species in pore water changes almost simultaneously with their concentration in the surrounding solution.

Place, publisher, year, edition, pages
1999. Vol. 218, 582-584 p.
Keyword [en]
Silicon nitride, dissolution of polydisperse solids
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:ri:diva-26722OAI: oai:DiVA.org:ri-26722DiVA: diva2:1053725
Note
A1275Available from: 2016-12-08 Created: 2016-12-08Bibliographically approved

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