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Control of silver throwing power by pulse reverse electroplating
RISE - Research Institutes of Sweden, Säkerhet och transport, Elektronik. Jönköping University, Sweden.ORCID-id: 0000-0002-7095-1907
Jönköping University, Sweden.
Jönköping University, Sweden.
RISE - Research Institutes of Sweden, Säkerhet och transport, Elektronik.
Vise andre og tillknytning
2017 (engelsk)Inngår i: Transactions of the Institute of Metal Finishing, ISSN 0020-2967, E-ISSN 1745-9192, Vol. 95, nr 1, s. 25-30Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The influence of electroplating parameters on throwing power (TP) is studied in additive-free silver cyanide solutions under direct current and pulse reverse electroplating conditions. It is found that the best TP is obtained when no agitation of the electrolyte is applied. The most important parameters for controlling the TP are the cathodic current density, the anodic to cathodic charge ratio, and the ratio between the anodic and cathodic current densities. Guidelines for process optimisation are given.

sted, utgiver, år, opplag, sider
2017. Vol. 95, nr 1, s. 25-30
Emneord [en]
Agitation, Pulse reverse electrodeposition, Silver, Throwing power, Electrolytes, Electroplating, Optimization, Cathodic charge, Cathodic current density, Direct current, Process optimisation, Pulse-reverse electrodeposition, Silver cyanide, Electroplating solutions
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Identifikatorer
URN: urn:nbn:se:ri:diva-29192DOI: 10.1080/00202967.2017.1260895Scopus ID: 2-s2.0-85009956051OAI: oai:DiVA.org:ri-29192DiVA, id: diva2:1086549
Tilgjengelig fra: 2017-04-03 Laget: 2017-04-03 Sist oppdatert: 2018-08-22bibliografisk kontrollert

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