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Monolayer study by VSFS: In situ response to compression and shear in a contact
KTH Royal Institute of Technology, Sweden.
KTH Royal Institute of Technology, Sweden.
KTH Royal Institute of Technology, Sweden.
KTH Royal Institute of Technology, Sweden.ORCID-id: 0000-0002-0790-194x
Vise andre og tillknytning
2014 (engelsk)Inngår i: Langmuir, ISSN 0743-7463, E-ISSN 1520-5827, Vol. 30, nr 11, s. 3075-3085Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Self-assembled octadecyltrichlorosilane ((OTS), CH3(CH 2)17SiCl3) layers on hydroxyl-terminated silicon oxide (SiO2) were prepared. The monolayers were characterized with atomic force microscopy (AFM) and contact angle measurements; their conformation was studied before, during, and after contact with a polymer (either PDMS or PTFE) surface using the vibrational sum frequency spectroscopy (VSFS) technique. During contact, the effect of pressure was studied for both polymer surfaces, but in the case of PTFE, the effect of shear rate on the contact was simultaneously studied. The VSFS response of the monolayers with pressure was almost entirely due to changes in the real area of contact with the polymer and therefore the Fresnel factors, whereas sliding caused disorder in the previously all-trans monolayer, as evidenced by a significant increase in the population of gauche defects.

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2014. Vol. 30, nr 11, s. 3075-3085
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URN: urn:nbn:se:ri:diva-6735DOI: 10.1021/la4042474Scopus ID: 2-s2.0-84897094136Lokal ID: 23756OAI: oai:DiVA.org:ri-6735DiVA, id: diva2:964575
Tilgjengelig fra: 2016-09-08 Laget: 2016-09-08 Sist oppdatert: 2021-06-18bibliografisk kontrollert

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Alvarez-Asencio, Ruben

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