Endre søk
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Improving the morphological stability of nickel germanide by tantalum and tungsten additions
Uppsala University, Sweden.
Uppsala University, Sweden.
RISE - Research Institutes of Sweden, Swerea, Swerea KIMAB AB. Uppsala University, Sweden.
CNRS-Université d'Aix-Marseille, France.
Vise andre og tillknytning
2018 (engelsk)Inngår i: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 112, nr 10, artikkel-id 103102Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

To enhance the morphological stability of NiGe, a material of interest as a source drain-contact in Ge-based field effect transistors, Ta or W, is added as either an interlayer or a capping layer. The efficacy of this Ta or W addition is evaluated with pure NiGe as a reference. While interlayers increase the NiGe formation temperature, capping layers do not retard the NiGe formation. Regardless of the initial position of Ta or W, the morphological stability of NiGe against agglomeration can be improved by up to 100 degrees C. The improved thermal stability can be ascribed to an inhibited surface diffusion, owing to Ta or W being located on top of NiGe after annealing, as confirmed by means of transmission electron microscopy, Rutherford backscattering spectrometry, and atom probe tomography. The latter also shows a 0.3 at. % solubility of Ta in NiGe at 450 degrees C, while no such incorporation of W is detectable. 

sted, utgiver, år, opplag, sider
2018. Vol. 112, nr 10, artikkel-id 103102
HSV kategori
Identifikatorer
URN: urn:nbn:se:ri:diva-33721DOI: 10.1063/1.5019440Scopus ID: 2-s2.0-85043306008OAI: oai:DiVA.org:ri-33721DiVA, id: diva2:1197811
Tilgjengelig fra: 2018-04-14 Laget: 2018-04-14 Sist oppdatert: 2019-01-09bibliografisk kontrollert

Open Access i DiVA

Fulltekst mangler i DiVA

Andre lenker

Forlagets fulltekstScopus
Av organisasjonen
I samme tidsskrift
Applied Physics Letters

Søk utenfor DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric

doi
urn-nbn
Totalt: 8 treff
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
v. 2.35.9