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Trench-Confined InP-Based Epitaxial Regrowth Using Metal-Organic Vapor-Phase Epitaxy
KTH Royal Institute of Technology, Sweden.
RISE - Research Institutes of Sweden, ICT, Acreo.
RISE - Research Institutes of Sweden, ICT, Acreo.
RISE - Research Institutes of Sweden, ICT, Acreo.
Vise andre og tillknytning
2018 (engelsk)Inngår i: Physica Status Solidi A, Vol. 215, artikkel-id 1700454Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

In this study, an area-selective metal-organic vapor-phase epitaxy (MOVPE) for trench-confined InP-based epitaxial regrowth in-between arrayed rectangular-shaped device elements is reported. Test structures are fabricated to investigate the influence of MOVPE growth and other processing parameters on regrowth control, doping incorporation, and morphology. For correctly chosen crystallographic mesa orientation and mask geometry, good control of growth selectivity, layer morphology, and doping concentration can be achieved, although with an enhanced and non-constant growth rate. This is discussed in terms of orientation-dependent growth rate and loading effects. In addition, a selective etch and regrowth approach which allows for the processing of field-effect transistors of significance for spatial light modulators with trench-integrated driver electronics is successfully implemented.

sted, utgiver, år, opplag, sider
2018. Vol. 215, artikkel-id 1700454
Emneord [en]
InP, metal-organic vapor-phase epitaxy, patterned substrate epitaxy, spatial light modulator
HSV kategori
Identifikatorer
URN: urn:nbn:se:ri:diva-33115DOI: 10.1002/pssa.201700454Scopus ID: 2-s2.0-85040201992OAI: oai:DiVA.org:ri-33115DiVA, id: diva2:1175068
Tilgjengelig fra: 2018-01-17 Laget: 2018-01-17 Sist oppdatert: 2019-03-28bibliografisk kontrollert

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