We report on a new fabrication method of producing ytterbium doped fibers by atomic layer deposition (ALD) in combination with the conventional modified chemical vapor deposition (MCVD) technique. An MCVD soot-preform with a porous layer of SiO2 is coated with layers of Yb2O3 and Al2O3 prior to sintering, using the gas-phase ALD method. An SEM/EDS material analysis study shows that the dopants successfully penetrate the full thickness of 320 μm of the soot layer. An Yb-doped fiber fabricated by this technique shows a background attenuation of 20 dB/km, a uniform longitudinal Yb-doping profile, and good laser characteristics with a slope efficiency of 80%. Furthermore, we present a comparison in terms of photodarkening between the MCVD-ALD fiber and a solution doped fiber, fabricated with the same MCVD recipe. The new MCVD-ALD fiber appears to be more photodarkening resistant.