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Electrodeposition: three steps towards sustainability
Chalmers University of Technology, Sweden.
RISE Research Institutes of Sweden, Materials and Production, Product Realisation Methodology.ORCID iD: 0000-0003-2908-6242
Chalmers University of Technology, Sweden.
2020 (English)In: Transactions of the Institute of Metal Finishing, ISSN 0020-2967, E-ISSN 1745-9192, Vol. 98, no 3, p. 108-113Article in journal (Refereed) Published
Abstract [en]

In the field of electrodeposition, it is becoming extremely important to integrate the technological progress with sustainability concerns expressed through recent environmental restrictions and regulations. This is especially relevant in consideration of the research dedicated to finding sustainable alternatives for coatings deposited with environmentally hazardous processes such as chromium plating. In this paper, the authors discuss different aspects of a proposed sustainable approach that could be applied as a guideline for future research.

Place, publisher, year, edition, pages
Taylor and Francis Ltd. , 2020. Vol. 98, no 3, p. 108-113
Keywords [en]
coatings, CRMs, Electrodeposition, REACH, recyclability, sustainability, SVHC, UN goals, Electrodes, Environmental regulations, Environmental restriction, Hazardous process, Technological progress, Sustainable development
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:ri:diva-45083DOI: 10.1080/00202967.2020.1748344Scopus ID: 2-s2.0-85085680464OAI: oai:DiVA.org:ri-45083DiVA, id: diva2:1449907
Note

Funding details: H2020 Marie Skłodowska-Curie Actions, MSCA, 642642; Funding details: Horizon 2020 Framework Programme, H2020; Funding text 1: This work was supported by the European Union’s Horizon 2020 research and innovation programme under the Marie Skłodowska-Curie grant agreement No 642642 (SELECTA). The contribution of J. H. was funded by the initiative Excellence in Production Research (XPRES).

Available from: 2020-06-30 Created: 2020-06-30 Last updated: 2024-05-21Bibliographically approved

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Hildenbrand, Jutta

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