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Publications (10 of 27) Show all publications
Wahlberg, E., He, H., Bergsten, T., Cedergren, K. & Eklund, G. (2024). Development of Graphene Quantum Hall Effect AC Metrology at RISE. In: : . Paper presented at 2024 Conference on Precision Electromagnetic Measurements (CPEM).
Open this publication in new window or tab >>Development of Graphene Quantum Hall Effect AC Metrology at RISE
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2024 (English)Conference paper, Poster (with or without abstract) (Other academic)
Abstract [en]

We present the first steps taken towards a graphene quantum Hall effect ac resistance standard at RISE. A new measurement setup has been developed including a graphene quantum Hall effect device suitable for the kilohertz range and a coaxial cryoprobe to be used together with a coaxial impedance bridge based on inductive voltage dividers. 1:1 ratio resistance measurements of the graphene device against a 12.9 kΩ ac resistance standard resulted in a linear frequency dependent (≈ 0.2(μΩ/Ω)/kHz) deviation from the quantized dc value.

National Category
Electrical Engineering, Electronic Engineering, Information Engineering Condensed Matter Physics
Identifiers
urn:nbn:se:ri:diva-75061 (URN)10.1109/CPEM61406.2024.10646073 (DOI)979-8-3503-6104-9 (ISBN)
Conference
2024 Conference on Precision Electromagnetic Measurements (CPEM)
Funder
Vinnova, 2020-04311
Available from: 2024-09-12 Created: 2024-09-12 Last updated: 2024-09-13Bibliographically approved
Shetty, N., Bergsten, T., Eklund, G., Avila, S. L., Kubatkin, S., Cedergren, K. & He, H. (2023). Long-term stability of molecular doped epigraphene quantum Hall standards: single elements and large arrays (R K/236 ≈ 109 Ω). Metrologia, 60(5), Article ID 055009.
Open this publication in new window or tab >>Long-term stability of molecular doped epigraphene quantum Hall standards: single elements and large arrays (R K/236 ≈ 109 Ω)
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2023 (English)In: Metrologia, ISSN 0026-1394, E-ISSN 1681-7575, Vol. 60, no 5, article id 055009Article in journal (Refereed) Published
Abstract [en]

In this work we investigate the long-term stability of epitaxial graphene (epigraphene) quantum Hall resistance standards, including single devices and an array device composed of 236 elements providing (R K/236 ≈ 109 Ω) , with R K the von Klitzing constant. All devices utilize the established technique of chemical doping via molecular dopants to achieve homogenous doping and control over carrier density. However, optimal storage conditions and the long-term stability of molecular dopants for metrological applications have not been widely studied. In this work we aim to identify simple storage techniques that use readily available and cost-effective materials which provide long-term stability for devices without the need for advanced laboratory equipment. The devices are stored in glass bottles with four different environments: ambient, oxygen absorber, silica gel desiccant, and oxygen absorber/desiccant mixture. We have tracked the carrier densities, mobilities, and quantization accuracies of eight different epigraphene quantum Hall chips for over two years. We observe the highest stability (i.e. lowest change in carrier density) for samples stored in oxygen absorber/desiccant mixture, with a relative change in carrier density below 0.01% per day and no discernable degradation of quantization accuracy at the part-per-billion level. This storage technique yields a comparable stability to the currently established best storage method of inert nitrogen atmosphere, but it is much easier to realize in practice. It is possible to further optimize the mixture of oxygen absorber/desiccant for even greater stability performance in the future. We foresee that this technique can allow for simple and stable long-term storage of polymer-encapsulated molecular doped epigraphene quantum Hall standards, removing another barrier for their wide-spread use in practical metrology. 

Place, publisher, year, edition, pages
Institute of Physics, 2023
Keywords
Carrier concentration; Cost effectiveness; Oxygen; Quantum Hall effect; Quantum theory; Silica gel; Stability; Storage (materials); Element array; Epitaxial graphene; Long term stability; Oxygen absorbers; Quantization accuracy; Quantum hall; Resistance; Simple++; Single element; Storage technique; Graphene
National Category
Physical Sciences
Identifiers
urn:nbn:se:ri:diva-67655 (URN)10.1088/1681-7575/acf3ec (DOI)2-s2.0-85173065852 (Scopus ID)
Note

This work was jointly supported by the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077, RMA15-0024 and FFL21-0129), Chalmers Area of Advance Nano, 2D TECH VINNOVA competence Center (Ref. 2019-00068), VINNOVA (Ref. 2020-04311 and 2021-04177), Marie Sklodowska-Curie Grant QUESTech No. 766025, Knut and Alice Wallenberg Foundation (2019.0140), and the Swedish Research Council VR (Contract Nos. 2021-05252 and 2018-04962). 

Available from: 2023-11-27 Created: 2023-11-27 Last updated: 2024-05-21Bibliographically approved
He, H., Cedergren, K., Shetty, N., Lara-Avila, S., Kubatkin, S., Bergsten, T. & Eklund, G. (2022). Accurate graphene quantum Hall arrays for the new International System of Units. Nature Communications, 13(1), Article ID 6933.
Open this publication in new window or tab >>Accurate graphene quantum Hall arrays for the new International System of Units
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2022 (English)In: Nature Communications, E-ISSN 2041-1723, Vol. 13, no 1, article id 6933Article in journal (Refereed) Published
Abstract [en]

Graphene quantum Hall effect (QHE) resistance standards have the potential to provide superior realizations of three key units in the new International System of Units (SI): the ohm, the ampere, and the kilogram (Kibble Balance). However, these prospects require different resistance values than practically achievable in single graphene devices (~12.9 kΩ), and they need bias currents two orders of magnitude higher than typical breakdown currents IC ~ 100 μA. Here we present experiments on quantization accuracy of a 236-element quantum Hall array (QHA), demonstrating RK/236 ≈ 109 Ω with 0.2 part-per-billion (nΩ/Ω) accuracy with IC ≥ 5 mA (~1 nΩ/Ω accuracy for IC = 8.5 mA), using epitaxial graphene on silicon carbide (epigraphene). The array accuracy, comparable to the most precise universality tests of QHE, together with the scalability and reliability of this approach, pave the road for wider use of graphene in the new SI and beyond. © 2022, The Author(s).

Place, publisher, year, edition, pages
Nature Research, 2022
Keywords
graphene, silicon carbide, Article, controlled study, intermethod comparison, international standard unit, measurement accuracy, quantization, quantum chemistry
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:ri:diva-61363 (URN)10.1038/s41467-022-34680-0 (DOI)2-s2.0-85141995185 (Scopus ID)
Note

Funding details: Stiftelsen för Strategisk Forskning, SSF, GMT14-0077, RMA15-0024; Funding details: VINNOVA; Funding text 1: This work was jointly supported by VINNOVA (Ref. 2020-04311 H.H. and 2021-04177 H.H.), the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077 S.K. and RMA15-0024 S.K.), 2D TECH VINNOVA competence Center (Ref. 2019-00068 S.L.), and Chalmers Excellence Initiative Nano S.L. This work was performed in part at Myfab Chalmers.; Funding text 2: This work was jointly supported by VINNOVA (Ref. 2020-04311 H.H. and 2021-04177 H.H.), the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077 S.K. and RMA15-0024 S.K.), 2D TECH VINNOVA competence Center (Ref. 2019-00068 S.L.), and Chalmers Excellence Initiative Nano S.L. This work was performed in part at Myfab Chalmers.

Available from: 2022-12-08 Created: 2022-12-08 Last updated: 2024-05-21Bibliographically approved
He, H., Lara-Avila, S., Kim, K., Fletcher, N., Rozhko, S., Bergsten, T., . . . Kubatkin, S. (2019). Polymer-encapsulated molecular doped epigraphene for quantum resistance metrology. Metrologia, 56(4), Article ID 045004.
Open this publication in new window or tab >>Polymer-encapsulated molecular doped epigraphene for quantum resistance metrology
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2019 (English)In: Metrologia, ISSN 0026-1394, E-ISSN 1681-7575, Vol. 56, no 4, article id 045004Article in journal (Refereed) Published
Abstract [en]

One of the aspirations of quantum metrology is to deliver primary standards directly to end-users thereby significantly shortening the traceability chains and enabling more accurate products. Epitaxial graphene grown on silicon carbide (epigraphene) is known to be a viable candidate for a primary realisation of a quantum Hall resistance standard, surpassing conventional semiconductor two-dimensional electron gases, such as those based on GaAs, in terms of performance at higher temperatures and lower magnetic fields. The bottleneck in the realisation of a turn-key quantum resistance standard requiring minimum user intervention has so far been the need to fine-tune the carrier density in this material to fit the constraints imposed by a simple cryo-magnetic system. Previously demonstrated methods, such as via photo-chemistry or corona discharge, require application prior to every cool-down as well as specialist knowledge and equipment. To this end we perform metrological evaluation of epigraphene with carrier density tuned by a recently reported permanent molecular doping technique. Measurements at two National Metrology Institutes confirm accurate resistance quantisation below 5n-1. Furthermore, samples show no significant drift in carrier concentration and performance on multiple thermal cycles over three years. This development paves the way for dissemination of primary resistance standards based on epigraphene

Place, publisher, year, edition, pages
Institute of Physics Publishing, 2019
Keywords
grapheme, measurement standards, molecular doping, quantum Hall effect, Carrier concentration, Electric corona, Gallium arsenide, Graphene, III-V semiconductors, Semiconducting gallium arsenide, Semiconductor doping, Silicon carbide, Two dimensional electron gas, Epitaxial graphene, National metrology institutes, Quantum Hall resistance, Quantum resistance, Resistance standards
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-39831 (URN)10.1088/1681-7575/ab2807 (DOI)2-s2.0-85070555097 (Scopus ID)
Available from: 2019-10-01 Created: 2019-10-01 Last updated: 2024-05-21Bibliographically approved
Rydler, K.-E., Bergsten, T. & Eklund, G. (2018). A Method for Realisation of Inductance and Quality Factor to 1 MHz. In: CPEM 2018 - Conference on Precision Electromagnetic Measurements: . Paper presented at 2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018.
Open this publication in new window or tab >>A Method for Realisation of Inductance and Quality Factor to 1 MHz
2018 (English)In: CPEM 2018 - Conference on Precision Electromagnetic Measurements, 2018Conference paper, Published paper (Refereed)
Abstract [en]

This paper describes a method for realisation of inductance and quality factor to high frequencies by determining the frequency response of gain-and phase-error of an inductance meter using two coils made of a single copper wire. As a starting point a traceable calibration of inductance at 1 kHz is used

Keywords
Impedance measurement, inductance, measurement, measurement standards, measurement techniques, Q measurement, resistance, Electric resistance, Frequency response, Gain and phase error, High frequency HF, Q measurements, Quality factors, Traceable calibration
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-36599 (URN)10.1109/CPEM.2018.8500813 (DOI)2-s2.0-85056995744 (Scopus ID)9781538609736 (ISBN)
Conference
2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018
Available from: 2018-12-17 Created: 2018-12-17 Last updated: 2024-05-21Bibliographically approved
Andersson, B.-O., Eklund, G. & Bergsten, T. (2018). Calibration of Gain Ratios on nV-Meters with the Reference Step Method. In: CPEM 2018 - Conference on Precision Electromagnetic Measurements: . Paper presented at 2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018.
Open this publication in new window or tab >>Calibration of Gain Ratios on nV-Meters with the Reference Step Method
2018 (English)In: CPEM 2018 - Conference on Precision Electromagnetic Measurements, 2018Conference paper, Published paper (Refereed)
Abstract [en]

The Reference Step Method for calibrators can be modified for calibration also of the gain ratios on a meter. The method has earlier been evaluated in the range 100 mV-1000 V on DMM HP 3458A1 and shows that an accuracy of typically < ± 0.2 μ V/V could be obtained. We have investigated the performance of the method when calibrating ratios in the range 1 mV-100 mV on two common nV-meters. In our comparisons with the Josephson Voltage Standard the differences are within ± ± 12μ V/V at the ratio 10m V:1mV and within ± ± 1.3μ V/V at 100mV:10mV.

Keywords
dc voltage build-up, DC voltage ratio, dc voltage scale, low voltage measurements, nanovoltmeter, Voltage measurement, Voltage scaling, DC voltage, Gain Ratio, Josephson voltage standards, Step method, Calibration
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-36598 (URN)10.1109/CPEM.2018.8501161 (DOI)2-s2.0-85057061401 (Scopus ID)9781538609736 (ISBN)
Conference
2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018
Available from: 2018-12-17 Created: 2018-12-17 Last updated: 2024-05-21Bibliographically approved
He, H., Lara-Avila, S., Bergsten, T., Eklund, G., Kim, K., Yakimova, R., . . . Kubatkin, S. (2018). Stable and Tunable Charge Carrier Control of Graphene for Quantum Resistance Metrology. In: 2018 Conference on Precision Electromagnetic Measurements (CPEM 2018): . Paper presented at 2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018.
Open this publication in new window or tab >>Stable and Tunable Charge Carrier Control of Graphene for Quantum Resistance Metrology
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2018 (English)In: 2018 Conference on Precision Electromagnetic Measurements (CPEM 2018), 2018Conference paper, Published paper (Refereed)
Abstract [en]

Here we demonstrate a stable and tunable method to alter the carrier concentration of epitaxial graphene grown on silicon carbide. This technique relies on chemical doping by an acceptor molecule. Through careful tuning one can produce chemically doped graphene quantum resistance devices which show long-term stability in ambient conditions and have performance comparable to that of GaAs quantum resistance standards. This development paves the way for controlled device fabrication of graphene quantum hall resistance standards, which can be reliably tailored to operate below 5 T and above 4 K out-of-the-box, without further adjustments from the end-user.

Keywords
chemical doping, graphene, measurement standards, quantum hall effect, Carrier concentration, Gallium arsenide, Graphene devices, III-V semiconductors, Silicon carbide, Acceptor molecules, Ambient conditions, Device fabrications, Long term stability, Quantum Hall resistance, Quantum resistance
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-36603 (URN)10.1109/CPEM.2018.8501252 (DOI)2-s2.0-85057054632 (Scopus ID)9781538609736 (ISBN)
Conference
2018 Conference on Precision Electromagnetic Measurements, CPEM 2018, 8 July 2018 through 13 July 2018
Note

Funding details: National Research Foundation of Korea, NRF; Funding details: VINNOVA; Funding details: Vetenskapsrådet, VR; Funding details: Stiftelsen för Strategisk Forskning, SSF; Funding details: Nanoscience and Nanotechnology Area of Advance, Chalmers Tekniska Högskola; Funding details: Sjögren’s Syndrome Foundation, SSF, IS14-0053; Funding details: Knut och Alice Wallenbergs Stiftelse

Available from: 2018-12-17 Created: 2018-12-17 Last updated: 2024-05-21Bibliographically approved
Eklund, G., Bergsten, T., Hagen, T., Palafox, L. & Behr, R. (2016). A comparison of the Josephson impedance bridges of PTB and SP. In: CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digest: . Paper presented at 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), July 10-15, 2016, Ottawa, Canada. , Article ID 7540584.
Open this publication in new window or tab >>A comparison of the Josephson impedance bridges of PTB and SP
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2016 (English)In: CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digest, 2016, article id 7540584Conference paper, Published paper (Refereed)
Abstract [en]

Josephson impedance comparison bridges have been developed at PTB and SP. The bridges are based on programmable Josephson voltage standards. We report the first ever comparison of Josephson impedance bridges performed with 1:1 and 1:10 capacitance ratio measurements up to 2 kHz.

Keywords
Impedance bridge, Josephson array, Josephson impedance bridge, Josephson voltage standard, Capacitance, Josephson junction devices, Voltage measurement, Capacitance ratio, Impedance bridges, Josephson, Josephson voltage standards, Programmable Josephson voltage standard, Electric measuring bridges
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-27627 (URN)10.1109/CPEM.2016.7540584 (DOI)2-s2.0-84986265790 (Scopus ID)9781467391344 (ISBN)
Conference
2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), July 10-15, 2016, Ottawa, Canada
Available from: 2016-12-22 Created: 2016-12-21 Last updated: 2024-05-21Bibliographically approved
Eklund, G., Bergsten, T. & Rydler, K.-E. (2016). A low frequency Josephson impedance bridge. In: CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digest: . Paper presented at 2016 Conference on Precision Electromagnetic Measurements, CPEM 2016, 10 July 2016 through 15 July 2016.
Open this publication in new window or tab >>A low frequency Josephson impedance bridge
2016 (English)In: CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digest, 2016Conference paper, Published paper (Refereed)
Abstract [en]

We describe a low frequency Josephson impedance bridge and the measurement methods. The bridge is useable below 400 Hz and is based on two programmable Josephson voltage standards. Measurements of 1:1, 1:2 and 1:10 capacitance ratio have been performed and compared with ratio measurements of an inductive voltage divider bridge. © 2016 IEEE.

Keywords
Impedance bridge, Josephson array, Josephson impedance bridge, Josephson voltage standard, Capacitance, Josephson junction devices, Voltage dividers, Voltage measurement, Capacitance ratio, Impedance bridges, Inductive voltage divider, Josephson voltage standards, Measurement methods, Measurements of, Programmable Josephson voltage standard, Electric measuring bridges
National Category
Natural Sciences
Identifiers
urn:nbn:se:ri:diva-27625 (URN)10.1109/CPEM.2016.7540509 (DOI)2-s2.0-84986272615 (Scopus ID)9781467391344 (ISBN)
Conference
2016 Conference on Precision Electromagnetic Measurements, CPEM 2016, 10 July 2016 through 15 July 2016
Note

References: Behr, R., Kieler, O., Kohlmann, J., Möller, F., Palafox, L., Devolopment and metrological applications of Josephson arrays at PTB (2012) Meas.Sci.Technol, 23 (12), p. 124002; Eklund, G., Bergsten, T., Tarasso, V., Rydler, K.-E., Determination of transition error corrections for low frequency stepwise-Approximated josephson sine waves (2011) IEEE Trans. Instrum. Meas, 60 (7), pp. 2399-2403; Lee, J., Schurr, J., Nissilä, J., Palafox, L., Behr, R., The Josephson two-Terminal-pair impedance bridge (2010) Metrologia, 47, pp. 453-459; Eklund, G., Bergsten, T., Tarasso, V., Rydler, K.-E., Progress towards an Impedance Bridge using two Programmable Josephson Voltage Standards (2014) CPEM 2014 Conference Digest, Rio de Janeiro, Brazil, , August; Palafox, L., Behr, R., Schurr, J., Kibble, B.P., Precision 10:1 capacitance ratio measurement using a josephson impedance bridge (2014) CPEM 2014 Conference Digest, Rio de Janeiro, Brazil, , August; Eklund, G., Bergsten, T., Hagen, T., Palafox, L., Behr, R., A comparison of the josephson impedance bridges of PTB and SP CPEM 2016 Conference Digest

Available from: 2016-12-22 Created: 2016-12-21 Last updated: 2024-05-21Bibliographically approved
Bergsten, T., Eklund, G. & He, H. (2016). Comparing GaAs and graphene QHR standards for resistance realisation at SP. In: Conference on Precision Electromagnetic Measurements 2016 (CPEM 2016): . Paper presented at Conference on Precision Electromagnetic Measurements 2016 (CPEM 2016), July 10-15, 2016, Ottawa, Canada.
Open this publication in new window or tab >>Comparing GaAs and graphene QHR standards for resistance realisation at SP
2016 (English)In: Conference on Precision Electromagnetic Measurements 2016 (CPEM 2016), 2016Conference paper, Poster (with or without abstract) (Other academic)
National Category
Engineering and Technology
Identifiers
urn:nbn:se:ri:diva-29104 (URN)
Conference
Conference on Precision Electromagnetic Measurements 2016 (CPEM 2016), July 10-15, 2016, Ottawa, Canada
Projects
EMRP GraphOhm
Available from: 2017-03-13 Created: 2017-03-13 Last updated: 2024-05-21Bibliographically approved
Organisations
Identifiers
ORCID iD: ORCID iD iconorcid.org/0009-0001-8772-6722

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