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Publications (10 of 24) Show all publications
Wahlberg, E., He, H., Bergsten, T., Cedergren, K. & Eklund, G. (2024). Development of Graphene Quantum Hall Effect AC Metrology at RISE. In: : . Paper presented at 2024 Conference on Precision Electromagnetic Measurements (CPEM).
Open this publication in new window or tab >>Development of Graphene Quantum Hall Effect AC Metrology at RISE
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2024 (English)Conference paper, Poster (with or without abstract) (Other academic)
Abstract [en]

We present the first steps taken towards a graphene quantum Hall effect ac resistance standard at RISE. A new measurement setup has been developed including a graphene quantum Hall effect device suitable for the kilohertz range and a coaxial cryoprobe to be used together with a coaxial impedance bridge based on inductive voltage dividers. 1:1 ratio resistance measurements of the graphene device against a 12.9 kΩ ac resistance standard resulted in a linear frequency dependent (≈ 0.2(μΩ/Ω)/kHz) deviation from the quantized dc value.

National Category
Electrical Engineering, Electronic Engineering, Information Engineering Condensed Matter Physics
Identifiers
urn:nbn:se:ri:diva-75061 (URN)10.1109/CPEM61406.2024.10646073 (DOI)979-8-3503-6104-9 (ISBN)
Conference
2024 Conference on Precision Electromagnetic Measurements (CPEM)
Funder
Vinnova, 2020-04311
Available from: 2024-09-12 Created: 2024-09-12 Last updated: 2024-09-13Bibliographically approved
Shetty, N., Chianese, F., He, H., Huhtasaari, J., Ghasemi, S., Moth-Poulsen, K., . . . Lara-Avila, S. (2024). Ultralow 1/f noise in epigraphene devices. Applied Physics Letters, 124(9), Article ID 093503.
Open this publication in new window or tab >>Ultralow 1/f noise in epigraphene devices
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2024 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 124, no 9, article id 093503Article in journal (Refereed) Published
Abstract [en]

We report the lowest recorded levels of 1/ f noise for graphene-based devices, at the level of S V / V 2 = S I / I 2 = 4.4 × 10 − 16 (1/Hz), measured at f = 10 Hz ( S V / V 2 = S I / I 2 < 10 − 16 1/Hz for f > 100 Hz) in large-area epitaxial graphene on silicon carbide (epigraphene) Hall sensors. This performance is made possible through the combination of high material quality, low contact resistance achieved by edge contact fabrication process, homogeneous doping, and stable passivation of the graphene layer. Our study explores the nature of 1/ f noise as a function of carrier density and device geometry and includes data from Hall sensors with device area range spanning over six orders of magnitude, with characteristic device length ranging from L = 1 μm to 1 mm. In optimized graphene Hall sensors, we demonstrate arrays to be a viable route to improve further the magnetic field detection: a simple parallel connection of two devices displays record-high magnetic field sensitivity at room temperature, with minimum detectable magnetic field levels down to B min = 9.5 nT/√Hz. The remarkable low levels of 1/ f noise observed in epigraphene devices hold immense capacity for the design and fabrication of scalable epigraphene-based sensors with exceptional performance. © 2024 Author(s).

Place, publisher, year, edition, pages
American Institute of Physics Inc., 2024
Keywords
Display devices; Electric connectors; Graphene devices; Magnetic fields; Silicon carbide; 1/F noise; 1/f-noise; Edge contacts; Epitaxial graphene; Fabrication process; Hall sensor; Magnetic-field; Materials quality; Performance; V/V; Graphene
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:ri:diva-72760 (URN)10.1063/5.0185890 (DOI)2-s2.0-85186477120 (Scopus ID)
Note

This work was jointly supported by the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077, RMA15-0024, and FFL21-0129), Chalmers Area of Advance Nano, Chalmers Area of Advance Energy, Chalmers Area of Advanced material, 2D TECH VINNOVA competence Center (Ref. 2019-00068), VINNOVA (Ref. 2020-04311 and 2021-04177), Marie Sklodowska-Curie grant QUESTech No. 766025, Knut and Alice Wallenberg Foundation (2019.0140), and the Swedish Research Council VR (Contract Nos. 2021-05252 and 2018-04962). This work was performed in part at Myfab Chalmers and Chalmers Materials Analysis Laboratory (CMAL).

Available from: 2024-05-16 Created: 2024-05-16 Last updated: 2024-08-14Bibliographically approved
Mašláň, S., He, H., Bergsten, T., Seitz, S. & Heins, T. P. (2023). Interlaboratory comparison of battery impedance analyzers calibration. Measurement, 218, Article ID 113176.
Open this publication in new window or tab >>Interlaboratory comparison of battery impedance analyzers calibration
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2023 (English)In: Measurement, ISSN 0263-2241, E-ISSN 1873-412X, Vol. 218, article id 113176Article in journal (Refereed) Published
Abstract [en]

The paper reports a results of series of interlaboratory comparisons of low impedance measurements at frequencies relevant for electrochemical impedance spectroscopy (EIS) of commercial lithium-ion cells. Two comparisons are presented. The first, bilateral comparison has focused on low impedance standards calibration in a full complex plane using digital sampling setups. The second comparison has focused on calibration and use of commercial 4-terminal battery EIS meters. Both comparisons have covered the impedance range from 50μ℧ to 100m℧ across the full complex plane in a frequency range from 0.01Hz up to 5kHz. Finally, the paper summarizes practices identified as critical for achieving measurement compatibility among various labs. © 2023 The Authors

Place, publisher, year, edition, pages
Elsevier B.V., 2023
Keywords
Battery, Comparison, Electrochemistry, Impedance, Impedance spectrum, Li-ion battery, Calibration, Electrochemical impedance spectroscopy, Battery impedance, Complex planes, Electrochemical-impedance spectroscopies, Impedance analyzer, Interlaboratory comparison, Low impedance, Lithium-ion batteries
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:ri:diva-65953 (URN)10.1016/j.measurement.2023.113176 (DOI)2-s2.0-85163161321 (Scopus ID)
Note

The National Physical Laboratory (NPL, Teddington, UK) and Institute for Applied Materials - Electrochemical Technologies, Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany contributed to the experiments reported in EIS meters comparison in Section 4. Authors would also like to thank to Torsten Funck from PTB for designing and constructing the impedance simulators used in the comparison. The comparison was carried out in scope of the EMPIR project LiBforSecUse (17IND10). The project received funding from the EMPIR programme, Germany co-financed by the Participating States and from the European Union's Horizon 2020 research and innovation programme. Preparation of this publication was partly funded by Institutional Subsidy for Long-Term Conceptual Development of a Research Organization granted to the Czech Metrology Institute by the Ministry of Industry and Trade.

Available from: 2023-08-24 Created: 2023-08-24 Last updated: 2023-12-05Bibliographically approved
Shetty, N., Bergsten, T., Eklund, G., Avila, S. L., Kubatkin, S., Cedergren, K. & He, H. (2023). Long-term stability of molecular doped epigraphene quantum Hall standards: single elements and large arrays (R K/236 ≈ 109 Ω). Metrologia, 60(5), Article ID 055009.
Open this publication in new window or tab >>Long-term stability of molecular doped epigraphene quantum Hall standards: single elements and large arrays (R K/236 ≈ 109 Ω)
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2023 (English)In: Metrologia, ISSN 0026-1394, E-ISSN 1681-7575, Vol. 60, no 5, article id 055009Article in journal (Refereed) Published
Abstract [en]

In this work we investigate the long-term stability of epitaxial graphene (epigraphene) quantum Hall resistance standards, including single devices and an array device composed of 236 elements providing (R K/236 ≈ 109 Ω) , with R K the von Klitzing constant. All devices utilize the established technique of chemical doping via molecular dopants to achieve homogenous doping and control over carrier density. However, optimal storage conditions and the long-term stability of molecular dopants for metrological applications have not been widely studied. In this work we aim to identify simple storage techniques that use readily available and cost-effective materials which provide long-term stability for devices without the need for advanced laboratory equipment. The devices are stored in glass bottles with four different environments: ambient, oxygen absorber, silica gel desiccant, and oxygen absorber/desiccant mixture. We have tracked the carrier densities, mobilities, and quantization accuracies of eight different epigraphene quantum Hall chips for over two years. We observe the highest stability (i.e. lowest change in carrier density) for samples stored in oxygen absorber/desiccant mixture, with a relative change in carrier density below 0.01% per day and no discernable degradation of quantization accuracy at the part-per-billion level. This storage technique yields a comparable stability to the currently established best storage method of inert nitrogen atmosphere, but it is much easier to realize in practice. It is possible to further optimize the mixture of oxygen absorber/desiccant for even greater stability performance in the future. We foresee that this technique can allow for simple and stable long-term storage of polymer-encapsulated molecular doped epigraphene quantum Hall standards, removing another barrier for their wide-spread use in practical metrology. 

Place, publisher, year, edition, pages
Institute of Physics, 2023
Keywords
Carrier concentration; Cost effectiveness; Oxygen; Quantum Hall effect; Quantum theory; Silica gel; Stability; Storage (materials); Element array; Epitaxial graphene; Long term stability; Oxygen absorbers; Quantization accuracy; Quantum hall; Resistance; Simple++; Single element; Storage technique; Graphene
National Category
Physical Sciences
Identifiers
urn:nbn:se:ri:diva-67655 (URN)10.1088/1681-7575/acf3ec (DOI)2-s2.0-85173065852 (Scopus ID)
Note

This work was jointly supported by the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077, RMA15-0024 and FFL21-0129), Chalmers Area of Advance Nano, 2D TECH VINNOVA competence Center (Ref. 2019-00068), VINNOVA (Ref. 2020-04311 and 2021-04177), Marie Sklodowska-Curie Grant QUESTech No. 766025, Knut and Alice Wallenberg Foundation (2019.0140), and the Swedish Research Council VR (Contract Nos. 2021-05252 and 2018-04962). 

Available from: 2023-11-27 Created: 2023-11-27 Last updated: 2024-05-21Bibliographically approved
Shetty, N., He, H., Mitra, R., Huhtasaari, J., Iordanidou, K., Wiktor, J., . . . Lara-Avila, S. (2023). Scalable Fabrication of Edge Contacts to 2D Materials: Implications for Quantum Resistance Metrology and 2D Electronics. ACS Applied Nano Materials, 6(7), 6292
Open this publication in new window or tab >>Scalable Fabrication of Edge Contacts to 2D Materials: Implications for Quantum Resistance Metrology and 2D Electronics
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2023 (English)In: ACS Applied Nano Materials, E-ISSN 2574-0970, Vol. 6, no 7, p. 6292-Article in journal (Refereed) Published
Abstract [en]

We report a reliable and scalable fabrication method for producing electrical contacts to two-dimensional (2D) materials based on the tri-layer resist system. We demonstrate the applicability of this method in devices fabricated on epitaxial graphene on silicon carbide (epigraphene) used as a scalable 2D material platform. For epigraphene, data on nearly 70 contacts result in median values of the one-dimensional (1D) specific contact resistances ρc ∼ 67 Ω·μm and follow the Landauer quantum limit ρc ∼ n-1/2, consistently reaching values ρc &lt; 50 Ω·μm at high carrier densityn. As a proof of concept, we apply the same fabrication method to the transition metal dichalcogenide (TMDC) molybdenum disulfide (MoS2). Our edge contacts enable MoS2 field-effect transistor (FET) behavior with an ON/OFF ratio of &gt;106 at room temperature (&gt;109 at cryogenic temperatures). The fabrication route demonstrated here allows for contact metallization using thermal evaporation and also by sputtering, giving an additional flexibility when designing electrical interfaces, which is key in practical devices and when exploring the electrical properties of emerging materials. © 2023 The Authors. 

Place, publisher, year, edition, pages
American Chemical Society, 2023
Keywords
2D material, edge-contacts, epitaxial graphene, graphene, MoS2, Fabrication, Field effect transistors, Graphene transistors, Layered semiconductors, Molybdenum disulfide, Silicon carbide, Thermal evaporation, Transition metals, Edge contacts, Electrical contacts, Fabrication method, Material-based, Quantum resistance, Resist systems, Tri-layer resists, Two-dimensional
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:ri:diva-64337 (URN)10.1021/acsanm.3c00652 (DOI)2-s2.0-85151511850 (Scopus ID)
Note

 Funding details: 2018-04962, 2021-05252; Funding details: H2020 Marie Skłodowska-Curie Actions, MSCA, 766025; Funding details: Stiftelsen för Strategisk Forskning, SSF, 2019-00068, FFL21-0129, GMT14-0077, RMA15-0024; Funding details: Knut och Alice Wallenbergs Stiftelse, 2019.0140; Funding text 1: This work was jointly supported by the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077, RMA15-0024, and FFL21-0129), Chalmers Area of Advance Nano, Chalmers Area of Advance Energy, 2D TECH VINNOVA competence Center (Ref. 2019-00068), Marie Sklodowska-Curie grant QUESTech No. 766025, Knut and Alice Wallenberg Foundation (2019.0140), and the Swedish Research Council VR (Contract Nos. 2021-05252 and 2018-04962). This work was performed in part at Myfab Chalmers and Chalmers Materials Analysis Laboratory (CMAL). The authors declare that the main data supporting the findings of this study are available within the article and supplementary information. Additional data are available from the corresponding author upon request.

Available from: 2023-05-05 Created: 2023-05-05 Last updated: 2024-06-11Bibliographically approved
He, H., Cedergren, K., Shetty, N., Lara-Avila, S., Kubatkin, S., Bergsten, T. & Eklund, G. (2022). Accurate graphene quantum Hall arrays for the new International System of Units. Nature Communications, 13(1), Article ID 6933.
Open this publication in new window or tab >>Accurate graphene quantum Hall arrays for the new International System of Units
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2022 (English)In: Nature Communications, E-ISSN 2041-1723, Vol. 13, no 1, article id 6933Article in journal (Refereed) Published
Abstract [en]

Graphene quantum Hall effect (QHE) resistance standards have the potential to provide superior realizations of three key units in the new International System of Units (SI): the ohm, the ampere, and the kilogram (Kibble Balance). However, these prospects require different resistance values than practically achievable in single graphene devices (~12.9 kΩ), and they need bias currents two orders of magnitude higher than typical breakdown currents IC ~ 100 μA. Here we present experiments on quantization accuracy of a 236-element quantum Hall array (QHA), demonstrating RK/236 ≈ 109 Ω with 0.2 part-per-billion (nΩ/Ω) accuracy with IC ≥ 5 mA (~1 nΩ/Ω accuracy for IC = 8.5 mA), using epitaxial graphene on silicon carbide (epigraphene). The array accuracy, comparable to the most precise universality tests of QHE, together with the scalability and reliability of this approach, pave the road for wider use of graphene in the new SI and beyond. © 2022, The Author(s).

Place, publisher, year, edition, pages
Nature Research, 2022
Keywords
graphene, silicon carbide, Article, controlled study, intermethod comparison, international standard unit, measurement accuracy, quantization, quantum chemistry
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:ri:diva-61363 (URN)10.1038/s41467-022-34680-0 (DOI)2-s2.0-85141995185 (Scopus ID)
Note

Funding details: Stiftelsen för Strategisk Forskning, SSF, GMT14-0077, RMA15-0024; Funding details: VINNOVA; Funding text 1: This work was jointly supported by VINNOVA (Ref. 2020-04311 H.H. and 2021-04177 H.H.), the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077 S.K. and RMA15-0024 S.K.), 2D TECH VINNOVA competence Center (Ref. 2019-00068 S.L.), and Chalmers Excellence Initiative Nano S.L. This work was performed in part at Myfab Chalmers.; Funding text 2: This work was jointly supported by VINNOVA (Ref. 2020-04311 H.H. and 2021-04177 H.H.), the Swedish Foundation for Strategic Research (SSF) (Nos. GMT14-0077 S.K. and RMA15-0024 S.K.), 2D TECH VINNOVA competence Center (Ref. 2019-00068 S.L.), and Chalmers Excellence Initiative Nano S.L. This work was performed in part at Myfab Chalmers.

Available from: 2022-12-08 Created: 2022-12-08 Last updated: 2024-05-21Bibliographically approved
He, H., Shetty, N., Kubatkin, S., Stadler, P., Löfwander, T., Fogelström, M., . . . Lara-Avila, S. (2022). Highly efficient UV detection in a metal-semiconductor-metal detector with epigraphene. Applied Physics Letters, 120(19), Article ID 191101.
Open this publication in new window or tab >>Highly efficient UV detection in a metal-semiconductor-metal detector with epigraphene
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2022 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 120, no 19, article id 191101Article in journal (Refereed) Published
Abstract [en]

We show that epitaxial graphene on silicon carbide (epigraphene) grown at high temperatures (T >1850 °C) readily acts as material for implementing solar-blind ultraviolet (UV) detectors with outstanding performance. We present centimeter-sized epigraphene metal-semiconductor-metal (MSM) detectors with a peak external quantum efficiency of η ∼85% for wavelengths λ = 250-280 nm, corresponding to nearly 100% internal quantum efficiency when accounting for reflection losses. Zero bias operation is possible in asymmetric devices, with the responsivity to UV remaining as high as R = 134 mA/W, making this a self-powered detector. The low dark currents Io ∼50 fA translate into an estimated record high specific detectivity D = 3.5 × 1015 Jones. The performance that we demonstrate, together with material reproducibility, renders epigraphene technologically attractive to implement high-performance planar MSM devices with a low processing effort, including multi-pixel UV sensor arrays, suitable for a number of practical applications. © 2022 Author(s).

Place, publisher, year, edition, pages
American Institute of Physics Inc., 2022
Keywords
Efficiency, Metals, Quantum efficiency, Silicon detectors, Epitaxial graphene, External quantum efficiency, Highest temperature, Internal quantum efficiency, Metal-semiconductor-metal detectors, Performance, Reflection loss, Solar blind ultraviolet, Ultra violet detection, Ultraviolet detection, Silicon carbide
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:ri:diva-59328 (URN)10.1063/5.0090219 (DOI)2-s2.0-85130080682 (Scopus ID)
Note

Funding details: Stiftelsen för Strategisk Forskning, SSF, 2019-00068, GMT14-0077, RMA15-0024; Funding text 1: This work was jointly supported by the Swedish Foundation for Strategic Research (Nos. GMT14-0077 and RMA15-0024), Chalmers Excellence Initiative Nano, and 2D TECH VINNOVA competence Center (Ref. No. 2019-00068). This work was performed in part at Myfab Chalmers.

Available from: 2022-06-20 Created: 2022-06-20 Last updated: 2023-12-05Bibliographically approved
Mašláň, S., He, H., Bergsten, T., Seitz, S. & Heins, T. P. (2022). Interlaboratory Comparison of Low Impedance for Impedance Spectroscopy. In: 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022: . Paper presented at 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022, 12 September 2022 through 14 September 2022 (pp. 227-232). International Measurement Confederation (IMEKO)
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2022 (English)In: 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022, International Measurement Confederation (IMEKO) , 2022, p. 227-232Conference paper, Published paper (Refereed)
Abstract [en]

The paper reports an interlaboratory comparison of low impedance measurements at frequencies relevant for electrochemical impedance spectroscopy (EIS) of commercial lithium-ion cells. The comparisons cover an impedance range from 50 μΩ to 100 mΩ across the full complex plane in a frequency range 0.01 Hz up to 5 kHz. A first comparison covered calibration of low impedance standards by reference digital sampling impedance setups in 4-terminal and 4 terminal-pair connections. A second comparison used commercial 4-terminal EIS meters to measure the low impedance standards characterised in the first comparison.

Place, publisher, year, edition, pages
International Measurement Confederation (IMEKO), 2022
Keywords
Analog to digital conversion, Electric variables measurement, Lithium-ion batteries, Complex planes, Digital sampling, Electrochemical-impedance spectroscopies, Frequency ranges, Impedance measurement, Impedance spectroscopy, Impedance standards, Interlaboratory comparison, Lithium-ion cells, Low impedance, Electrochemical impedance spectroscopy
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:ri:diva-62603 (URN)2-s2.0-85145879514 (Scopus ID)9781713862833 (ISBN)
Conference
25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022, 12 September 2022 through 14 September 2022
Note

Funding details: Horizon 2020 Framework Programme, H2020; Funding details: European Metrology Programme for Innovation and Research, EMPIR; Funding details: National Physical Laboratory, NPL; Funding text 1: The National Physical Laboratory (NPL, Teddington, UK) and Institute for Applied Materials - Electrochemical Technologies, Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany contributed to experiments reported in EIS meters comparison in section iv. The comparison was carried out in scope of the EMPIR project LiBforSecUse (17IND10). The project received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.; Funding text 2: VI. ACKNOWLEDGMENT The National Physical Laboratory (NPL, Teddington, UK) and Institute for Applied Materials - Electrochemical Technologies, Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany contributed to experiments reported in EIS meters comparison in section iv. The comparison was carried out in scope of the EMPIR project LiBforSecUse (17IND10). The project received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.

Available from: 2023-01-24 Created: 2023-01-24 Last updated: 2023-12-05Bibliographically approved
Mašláň, S., He, H., Bergsten, T., Seitz, S. & Heins, T. P. (2022). Interlaboratory Comparison of Low Impedance for Impedance Spectroscopy. In: 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022Pages 227 - 232: . Paper presented at 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022. Brescia. 12 September 2022 through 14 September 2022 (pp. 227-232). International Measurement Confederation (IMEKO)
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2022 (English)In: 25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022Pages 227 - 232, International Measurement Confederation (IMEKO) , 2022, p. 227-232Conference paper, Published paper (Refereed)
Abstract [en]

The paper reports an interlaboratory comparison of low impedance measurements at frequencies relevant for electrochemical impedance spectroscopy (EIS) of commercial lithium-ion cells. The comparisons cover an impedance range from 50 ΌΩ to 100 mΩ across the full complex plane in a frequency range 0.01 Hz up to 5 kHz. A first comparison covered calibration of low impedance standards by reference digital sampling impedance setups in 4-terminal and 4 terminal-pair connections. A second comparison used commercial 4-terminal EIS meters to measure the low impedance standards characterised in the first comparison. 

Place, publisher, year, edition, pages
International Measurement Confederation (IMEKO), 2022
Keywords
Analog to digital conversion; Electric variables measurement; Lithium-ion batteries, Complex planes; Digital sampling; Electrochemical-impedance spectroscopies; Frequency ranges; Impedance measurement; Impedance spectroscopy; Impedance standards; Interlaboratory comparison; Lithium-ion cells; Low impedance, Electrochemical impedance spectroscopy
National Category
Materials Engineering
Identifiers
urn:nbn:se:ri:diva-68168 (URN)2-s2.0-85145879514 (Scopus ID)
Conference
25th IMEKO TC-4 International Symposium on Measurement of Electrical Quantities, IMEKO TC-4 2022 and 23rd International Workshop on ADC and DAC Modelling and Testing, IWADC 2022. Brescia. 12 September 2022 through 14 September 2022
Note

 The project received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.

Available from: 2023-12-05 Created: 2023-12-05 Last updated: 2024-01-03Bibliographically approved
Karimi, B., He, H., Chang, Y.-C. -., Wang, L., Pekola, J. P., Yakimova, R., . . . Kubatkin, S. (2021). Electron-phonon coupling of epigraphene at millikelvin temperatures measured by quantum transport thermometry. Applied Physics Letters, 118(10)
Open this publication in new window or tab >>Electron-phonon coupling of epigraphene at millikelvin temperatures measured by quantum transport thermometry
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2021 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 118, no 10Article in journal (Refereed) Published
Place, publisher, year, edition, pages
American Institute of Physics Inc., 2021
Keywords
Electron-phonon interactions; Graphene; Heat transfer; Thermometers, Electrical conductivity; Electron phonon couplings; Heat transport property; Kelvin temperatures; Logarithmic dependence; Millikelvin temperatures; Noise equivalent power; Two-dimensional conductors, Quantum chemistry
National Category
Materials Engineering
Identifiers
urn:nbn:se:ri:diva-68169 (URN)10.1063/5.0031315 (DOI)2-s2.0-85102432835 (Scopus ID)
Available from: 2023-12-05 Created: 2023-12-05 Last updated: 2023-12-05Bibliographically approved
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ORCID iD: ORCID iD iconorcid.org/0000-0003-1962-5572

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